Sr Engineer R&D Source Mask Optimization

Introduction ASML US brings together the most creative minds in science and technology to develop lithography machines that are key to producing faster, cheaper, more energy-efficient microchips. We design, develop, integrate, market and service these advanced machines, which enable our customers - the world’s leading chipmakers - to reduce the size and increase the functionality of their microchips, which in turn leads to smaller, more powerful consumer electronics.

Our headquarters are in Veldhoven, the Netherlands, and we have 18 office locations around the United States including main offices in Chandler Arizona, San Jose and San Diego California, Wilton Connecticut, and Hillsboro Oregon. Job Mission The job's primary responsibilities include the modeling of complex optical phenomena in ASML photolithography scanners and the optimization of scanner configuration and photomask layout to enable the continuing shrink of semiconductor devices through resolution enhancement, to match the imaging performance across a fleet of scanners, and to assist in future scanner design.

Job Description As a member of the Source-Mask Optimization R&D team, the job entails large-scale C++ and Python software development that co-optimizes the light source, lenses and mirrors, and dose and focus settings within the ASML family of XT, NXT, and NXE scanners, as well as the photomask patterns, sub-resolution assist features, and their target design. The job requires an understanding of the optical physics and photoresist chemistry, modern optimization and machine learning algorithms, and C++/Python software design.